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ITRI Chinese Taipei, Singapore's National Metrology Center and the UK's National Physical Laboratory Delegates Visit the Center for Measurement Standards at ITRI to Strengthen Metrology Collaboration

2024-11-19

  The Center for Measurement Standards at the Industrial Technology Research Institute (CMS/ITRI) recently welcomed representatives from two prominent international metrology institutions: Singapore’s National Metrology Center (NMC) in June and the UK's National Physical Laboratory (NPL) in September.

During the June visit, Professor Gregory Goh, CEO of NMC, and his team were impressed by CMS’s metrology advancements, particularly its innovative semiconductor testing facilities. Discussions focused on the critical metrology needs of the semiconductor and battery industries, including electromagnetic metrology and the certification of Battery Energy Storage Systems (BESS). This visit fostered mutual understanding and laid the foundation for future technological collaboration.

  On September 2, a delegation from NPL, led by Professor Fernando Araujo de Castro, visited CMS to further explore collaboration in metrology. The delegation included Dr. Sebastian Wood and Dr. Yameng Cao. During the visit, Professor Araujo de Castro presented NPL’s latest advancements in materials testing technologies and discussed potential future research directions. Conversations centered on how recent technological innovations could significantly enhance metrology precision and efficiency within the semiconductor industry. The NPL delegation also toured CMS’s semiconductor testing laboratory, which features optical inspection and detection technologies used in both front-end and back-end semiconductor processes. This tour provided NPL representatives with a thorough understanding of CMS’s expertise and capabilities.

  Both visits strengthened the collaborative relationships between CMS, NMC, and NPL, paving the way for future technological developments and standardization efforts. Both parties are committed to deepening their cooperation to advance the semiconductor industry and support global metrology development. This collaboration is expected to lead to new opportunities and breakthroughs in the field.

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Fig 1. Executive Director Professor Gregory Goh, NMC (center), Executive Director Dr. Yu-Ping Lan, CMS (center-right) and former Executive Director Dr. Tzeng-Yow Lin, CMS (center-left)


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Fig 2. Professor Fernando Araujo de Castro, NPL (fourth on the right) and Dr. Wei-En Fu, CMS (fifth on the right)



Contributor: Jackie Jiang, ITRI, Chinese Taipei


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