2019 - Sydney - Australia
Meeting documents
1.4 - Review of 2018 TCMM meeting record
2.2 - Hilghlights from CCL WG-N
2.3 - Highlights from CCQM SAWG
2.4 - Highlights from VAMAS SC meeting 2019
2.5 - Highlights from ISO TC229 meetings Sydney/Beijing
2.6 - TCMM linkages document
3.1 - Country report - NMIA Australia
3.2 -Country report - Chinese Taipei - CMSITRI
3.4 -Country report - Japan - NMIJ
3.5 Country report - Korea - KRISS
3.6 - Country report - Thailand - NIMT
4.1 - KRISS Introduction to KRISS MM research topic for collaboration/comparison: Thermoelectric measurement for low-dimensional materials
5.1 - Final words on completion of APMP L-S5
5.2 - Draft A2 report of SC on Tensile Properties Measurement. APMP M.MM-S1
5.3 - ILC final result of APMP/TCMM-VAMAS/TWA41 ILC on the graphene oxide thickness by AFM
5.4 - Draft proposol of ILC on Si{220} lattice spacing by TEM
5.5 - Joint meeting with TCL - SC on ultra-thin film thickness by XRR
Meeting agenda
TCMM Meeting 2019 - minutes
1 AFM measurements of Si lattice spacing WEFu CMSITRI.pdf
10 Nanoscale characterisation of critical dimensions for semi industry beyond N7 WEF CMSITRI
3 Calibrating an AFM with Si 111 lattice steps at NMIA MLawn NMIA
4 Au 111 lattice spacing reference material and TEM-based strain measurement XLi NIM
5 Local geometric error corrections for a metrological scanning probe microscope BBabic NMIA
8 Key points for reliable film thickness evaluation by XRR YAzuma NMIJ
Workshop agenda